Lithographic Stepping Trajectory Planning for Residual Vibration Suppression: An Asymmetric S-Curve Method
Author:
Affiliation:
1. Center of Ultra-precision, Optoelectronic Instrument Engineering Harbin Institute of Technology,Harbin,China
Funder
National Natural Science Foundation of China
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10365714/10366059/10366135.pdf?arnumber=10366135
Reference16 articles.
1. Ultra-precision engineering in lithographic exposure equipment for the semiconductor industry
2. On Step-and-Scan Trajectories used in Wafer Scanners in Semiconductor Manufacturing
3. Kinodynamic Generation of Wafer Scanners Trajectories Used in Semiconductor Manufacturing
4. Position Control in Lithographic Equipment [Applications of Control]
5. High-Precision Motion Control Techniques: A Promising Approach to Improving Motion Performance
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