Ultrafast van der Waals diode using graphene quantum capacitance and Fermi-level depinning

Author:

Hong Sungjae1ORCID,Hong Chang-Ui2,Lee Sol13ORCID,Jang Myeongjin13ORCID,Jang Chorom2ORCID,Lee Yangjin13ORCID,Widiapradja Livia Janice1ORCID,Park Sam1,Kim Kwanpyo13ORCID,Son Young-Woo4ORCID,Yook Jong-Gwan2ORCID,Im Seongil1ORCID

Affiliation:

1. Department of Physics, Van der Waals Materials Research Center, Yonsei University, Seoul 03722, Republic of Korea.

2. Department of Electrical Engineering, Yonsei University, Seoul 03722, Republic of Korea.

3. Center for Nanomedicine, Institute for Basic Science (IBS), Seoul 03722, Republic of Korea.

4. School of Computational Sciences, Korea Institute for Advanced Study, Seoul 02455, Republic of Korea.

Abstract

Graphene, with superior electrical tunabilities, has arisen as a multifunctional insertion layer in vertically stacked devices. Although the role of graphene inserted in metal-semiconductor junctions has been well investigated in quasi-static charge transport regime, the implication of graphene insertion at ultrahigh frequencies has rarely been considered. Here, we demonstrate the diode operation of vertical Pt/n-MoSe 2 /graphene/Au assemblies at ~200-GHz cutoff frequency (f C ). The electric charge modulation by the inserted graphene becomes essentially frozen above a few GHz frequencies due to graphene quantum capacitance–induced delay, so that the Ohmic graphene/MoSe 2 junction may be transformed to a pinning-free Schottky junction. Our diodes exhibit much lower total capacitance than devices without graphene insertion, deriving an order of magnitude higher f C , which clearly demonstrates the merit of graphene at high frequencies.

Publisher

American Association for the Advancement of Science (AAAS)

Subject

Multidisciplinary

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