Actual defect observation results of an extreme-ultraviolet blank mask by coherent diffraction imaging
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,General Engineering
Link
http://stacks.iop.org/1882-0786/9/i=3/a=035202/pdf
Reference26 articles.
1. Wavelength-specific reflections: A decade of extreme ultraviolet actinic mask inspection research
2. Actinic imaging and evaluation of phase structures on extreme ultraviolet lithography masks
3. Quantitative evaluation of mask phase defects from through-focus EUV aerial images
4. Printability of native blank defects and programmed defects and their stack structures
5. Defect Characterization of an Extreme-Ultraviolet Mask Using a Coherent Extreme-Ultraviolet Scatterometry Microscope
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2. Nondestructive, high-resolution, chemically specific 3D nanostructure characterization using phase-sensitive EUV imaging reflectometry;Science Advances;2021-01-29
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5. Development of an EUV Microscope with Focused Coherent EUV Based on Coherent Diffraction Imaging Method for Defect Evaluation on an EUV Mask;Electronics and Communications in Japan;2018-01-19
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