Measurement of energy flux to a substrate by thermal and Langmuir probes during inductively coupled plasma assisted DC magnetron sputtering
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/54/i=1S/a=01AB02/pdf
Reference30 articles.
1. Sputter Type HF Ion Source for Ion Beam Deposition Apparatus
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3. MgO deposition using reactive ionized sputtering
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5. Deposition of transparent conducting Al-doped ZnO thin films by ICP-assisted sputtering
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1. Energy distribution function of substrate incident negative ions in magnetron sputtering of metal-doped ZnO target measured by magnetized retarding field energy analyzer;Japanese Journal of Applied Physics;2023-06-30
2. The Use of Passive Thermal Probes for the Determination of Energy Fluxes in Atmospheric Pressure Plasmas;IEEE Transactions on Plasma Science;2021-11
3. Noncontact measurement of substrate temperature by optical low-coherence interferometry in high-power pulsed magnetron sputtering;Japanese Journal of Applied Physics;2017-11-13
4. Energy flux to the substrate in a magnetron discharge with hollow cathode;Thin Solid Films;2017-10
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