Noncontact measurement of substrate temperature by optical low-coherence interferometry in high-power pulsed magnetron sputtering
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/57/i=1S/a=01AC03/pdf
Reference31 articles.
1. Titanium oxide thin films deposited by high-power impulse magnetron sputtering
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5. Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti–Cu thin films
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1. Effect of pulse width on deposition of diamond-like carbon on high-power pulsed magnetron sputtering;Japanese Journal of Applied Physics;2023-06-29
2. Science-based, data-driven developments in plasma processing for material synthesis and device-integration technologies;Japanese Journal of Applied Physics;2022-11-30
3. Fiber Bragg grating sensor for in situ substrate temperature measurement in a magnetron sputtering system;Physica Scripta;2022-08-17
4. Formation of Diamond-Like Carbon Film on Organic Substrate by High Power Impulse Magnetron Sputtering;Journal of The Surface Finishing Society of Japan;2022-01-01
5. Precise thickness profile measurement insensitive to spatial and temporal temperature gradients on a large glass substrate;Applied Optics;2020-07-06
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