Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti–Cu thin films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3467001
Reference37 articles.
1. Planar magnetron sputtering
2. K. Ellmer, in Low Temperature Plasmas, edited by R. Hippler, H. Kersten, M. Schmidt, and K. H. Schoenbach (Wiley, New York, 2009), Vol. 2, p. 675.
3. Microstructural evolution during film growth
4. Physical properties of homogeneous TiO2films prepared by high power impulse magnetron sputtering as a function of crystallographic phase and nanostructure
5. Ionization of sputtered material in a planar magnetron discharge
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