Effects of O2and H2O on SO2removal by dielectric barrier discharge at various temperatures
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference37 articles.
1. Reversible absorption of SO2 by amino acid aqueous solutions
2. Microdischarge in Porous Ceramics with Atmospheric Pressure High Temperature H2O/SO2Gas Mixture and its Application for Hydrogen Production
3. Investigation of simultaneous adsorption of SO2 and NO on γ-alumina at low temperature using DRIFTS
4. Oxidization of SO2 by Reactive Oxygen Species for Flue Gas Desulfurization and H2SO4 Production
5. Efficient capture of SO2 by a binary mixture of caprolactam tetrabutyl ammonium bromide ionic liquid and water
Cited by 13 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Research progress on elemental mercury (Hg0) removal in flue gas using non-thermal plasma technology;Environmental Pollution;2024-11
2. The effects of inner electrode shape on the performance of dielectric barrier discharge reactor for oxidative removal of NO and SO2;Plasma Science and Technology;2024-07-01
3. Removal of Volatile Organic Compounds from Coal-Fired Power Plants Using Nonthermal Plasma Generated by a Dielectric Barrier Discharge Reactor: Carbon Yield and Application Feasibility;Industrial & Engineering Chemistry Research;2023-09-14
4. Sensitivity analysis of an ammonium salt formation model applied to pollutant removal in marine diesel exhaust gases;Fuel;2023-01
5. Characteristics of Generic Dielectric Materials and Char as Bed Materials of a Dielectric Barrier Discharge Reactor under High Temperature and Wide Frequency Range;Energies;2022-12-06
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3