Simple fabrication process for UV nanoimprint mold with embedded metal alignment marks for in-liquid alignment
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/53/i=6S/a=06JK01/pdf
Reference18 articles.
1. Mold-assisted nanolithography: A process for reliable pattern replication
2. Step and flash imprint lithography: a new approach to high-resolution patterning
3. Imprint Characteristics by Photo-Induced Solidification of Liquid Polymer
4. Imprint lithography for integrated circuit fabrication
5. Fabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels
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1. Fluorescence alignment simulation for atomic-scale position adjustment in ultraviolet nanoimprint lithography;Journal of Vacuum Science & Technology B;2022-12
2. Fluorescence imprint alignment using additive-type inclination moiré fringes;Japanese Journal of Applied Physics;2020-03-09
3. Fabrication of multilayered structure of silver nanorod arrays for plasmon memory;Microelectronic Engineering;2018-06
4. Development of UV-curable liquid for in-liquid fluorescence alignment in ultraviolet nanoimprint lithography;Japanese Journal of Applied Physics;2018-05-14
5. Principle and observation of fluorescence moiré fringes for alignment in print and imprint methods;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-11
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