Effect of carbon situating at end-of-range defects on silicon self-diffusion investigated using pre-amorphized isotope multilayers
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/55/i=3/a=036504/pdf
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1. Reduction of transient boron diffusion in preamorphized Si by carbon implantation
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1. Effect of fluorine on the suppression of boron diffusion in pre-amorphized silicon;Journal of Applied Physics;2020-09-14
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