Rapid electron density decay observed by surface-wave probe in afterglow of pulsed fluorocarbon-based plasma-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Rapid electron density decay observed by surface-wave probe in afterglow of pulsed fluorocarbon-based plasma

Published:2016-07-15 Issue:8 Volume:55 Page:080309
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Ohya Yoshinobu,Iwata Manabu,Ishikawa Kenji,Sekine Makoto,Hori Masaru,Sugai Hideo

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/55/i=8/a=080309/pdf

Reference28 articles.

1. Pulsed plasma etching for semiconductor manufacturing

2. Charge Damage Caused by Electron Shading Effect

3. Pulsed Plasma Processing for Reduction of Profile Distortion Induced by Charge Buildup in Electron Cyclotron Resonance Plasma

4. Highly Selective and Highly AnisotropicSiO2Etching in Pulse-Time Modulated Electron Cyclotron Resonance Plasma

5. Diagnostics and control of radicals in an inductively coupled etching reactor

Cited by 16 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Overall aspect for designing magnetron sputtering plasma sources and their applications in the deposition of ITO films;AIP Advances;2024-05-01

2. Time-varying mechanism of ion composition in a pulse-modulated Ar/C₄F₈/O₂ dual-frequency capacitively coupled plasma;Japanese Journal of Applied Physics;2023-12-26

3. An approach to reduce surface charging with cryogenic plasma etching using hydrogen-fluoride contained gases;Applied Physics Letters;2023-11-20

4. Mass spectroscopic measurement of time-varying ion composition in a pulse-modulated Ar/C₄F₈/O₂ dual-frequency capacitively coupled plasma;Japanese Journal of Applied Physics;2023-03-10

5. Science-based, data-driven developments in plasma processing for material synthesis and device-integration technologies;Japanese Journal of Applied Physics;2022-11-30

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3