Electrical characteristics and step coverage of ZrO2films deposited by atomic layer deposition for through-silicon via and metal–insulator–metal applications
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference40 articles.
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1. Effect of ALD Processes on Physical and Electrical Properties of HfO2 Dielectrics for the Surface Passivation of a CMOS Image Sensor Application;IEEE Access;2022
2. Atomic Layer Deposition of Zirconium Dioxide from Zirconium Tetraiodide and Ozone;ECS Journal of Solid State Science and Technology;2018
3. Wafer level package of Au-Ge system using a Ge chemical vapor deposition (CVD) thin film;Applied Surface Science;2016-11
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