Spatial profiles of electron density, electron temperature, average ionic charge, and EUV emission of laser-produced Sn plasmas for EUV lithography-Reference-Cited by-同舟云学术

Spatial profiles of electron density, electron temperature, average ionic charge, and EUV emission of laser-produced Sn plasmas for EUV lithography

Published:2017-01-31 Issue:3 Volume:56 Page:036201
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Sato Yuta,Tomita Kentaro,Tsukiyama Syoichi,Eguchi Toshiaki,Uchino Kiichiro,Kouge Kouichiro,Tomuro Hiroaki,Yanagida Tatsuya,Wada Yasunori,Kunishima Masahito,Kodama Takeshi,Mizoguchi Hakaru

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/56/i=3/a=036201/pdf

Reference37 articles.

1. High-power EUV lithography sources based on gas discharges and laser-produced plasmas

2. Enhancement of extreme ultraviolet emission from a lithium plasma by use of dual laser pulses

3. New type of discharge-produced plasma source for extreme ultraviolet based on liquid tin jet electrodes

4. Plasma sources for EUV lithography exposure tools

Cited by 16 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Experimental study of the dynamics and extreme ultraviolet radiation of laser produced colliding Sn plasmas;Physics of Plasmas;2024-04-01

2. Toward streaked collective Thomson scattering measurements on an extreme ultraviolet plasma light source;Review of Scientific Instruments;2023-04-01

3. Numerical simulation of laser-produced plasma expansion on a droplet surface;Scientific Reports;2023-03-11

4. Observation of plasma inflows in laser-produced Sn plasma and their contribution to extreme-ultraviolet light output enhancement;Scientific Reports;2023-02-01

5. Experimental study of dynamics and soft X-ray emission of laser produced plasma from low-density foam Ti targets;Vacuum;2023-01