New type of discharge-produced plasma source for extreme ultraviolet based on liquid tin jet electrodes-Reference-Cited by-同舟云学术

New type of discharge-produced plasma source for extreme ultraviolet based on liquid tin jet electrodes

Published:2012-05-16 Issue:2 Volume:11 Page:021103-1
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Koshelev Konstantin,Krivtsun Vladimir,Ivanov Vladimir,Yakushev Oleg,Chekmarev Alexey,Koloshnikov Vsevolod,Snegirev Evegenii,Medvedev Viacheslav

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference14 articles.

1. Attwood, D. ,X-rays and Extreme Ultraviolet Radiation: Principles and Applications, Cambridge University Press, Cambridge (1999).

2. Bakshi, V. ,EUV Sources for Lithography, SPIE Press, Bellingham, WA (2006).

3. Koshelev, K. et al., Some physical aspects of EUV source problem, Sematech EUVL Source Workshop, Dallas, TX (2002).

4. Banine, V., K. Koshelev and E. Kieft , Extreme ultraviolet sources for lithography applications. in 2nd Intl. EUVL Symposium, 30 September to 02 October 2003, Antwerp, Belgium (2003).

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