Hot-wire chemical vapor deposition prepared aluminum doped p-type microcrystalline silicon carbide window layers for thin film silicon solar cells
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference19 articles.
1. Low substrate temperature deposition of crystalline SiC using HWCVD
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3. Preparation of nanocrystalline cubic silicon carbide thin films by hot-wire CVD at various filament-to-substrate distances
4. Effect of Plasma Power on Structure of Hydrogenated Nanocrystalline Cubic Silicon Carbide Films Deposited by Very High Frequency Plasma-Enhanced Chemical Vapor Deposition at a Low Substrate Temperature
5. Low temperature deposition of nanocrystalline silicon carbide films by plasma enhanced chemical vapor deposition and their structural and optical characterization
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1. Transparent silicon carbide/tunnel SiO 2 passivation for c‐Si solar cell front side: Enabling J sc > 42 mA/cm 2 and i V oc of 742 mV;Progress in Photovoltaics: Research and Applications;2020-01-16
2. Optimization of Transparent Passivating Contact for Crystalline Silicon Solar Cells;IEEE Journal of Photovoltaics;2020-01
3. Nanocrystalline Silicon and Solar Cells;Handbook of Photovoltaic Silicon;2019
4. Light Management in Crystalline and Thin Film Silicon Solar Cells;Photovoltaic Solar Energy;2017-01-07
5. Nanocrystalline Silicon and Solar Cells;Handbook of Photovoltaic Silicon;2017
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