Fluorine and oxygen plasma exposure behavior of yttrium oxyfluoride ceramics-Reference-Cited by-同舟云学术

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Fluorine and oxygen plasma exposure behavior of yttrium oxyfluoride ceramics

Published:2019-05-30 Issue:SE Volume:58 Page:SEEC01
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Miyashita Kenji,Tsunoura Toru,Yoshida Katsumi,Yano Toyohiko,Kishi Yukio

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

https://iopscience.iop.org/article/10.7567/1347-4065/ab1636/pdf

Reference29 articles.

1. Cramming More Components Onto Integrated Circuits

2. New chamber walls conditioning and cleaning strategies to improve the stability of plasma processes

3. Comparisons of NF3 plasma-cleaned Y2O3, YOF, and YF3 chamber coatings during silicon etching in Cl2 plasmas

4. Plasma etching behavior of Y2O3 ceramics: Comparative study with Al2O3

Cited by 21 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Formation of YOF on Y2O3 through surface modification with NH4F and its plasma-resistance behavior;Ceramics International;2024-09

2. The Etching Behaviour and Fluorine-Based-Plasma Resistance of YOF Coatings Deposited by Atmospheric Plasma Spraying;Coatings;2024-08-26

3. Effect of porosity on etching rate and crater-like microstructure of sintered Al2O3, Y2O3, and YAG ceramics in plasma etching;Ceramics International;2024-05

4. Physiochemical etching characteristics and surface analysis of Y2O3-MgO nanocomposite under different CF4/Ar/O2 plasma atmospheres;Applied Surface Science;2023-12

5. Effects of HfO2 addition on the plasma resistance of Y2O3 thin films deposited by e-beam PVD;Applied Surface Science;2023-12

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