Boron Trichloride Dry Etching
Author:
Publisher
CRC Press
Link
http://www.crcnetbase.com/doi/pdf/10.1081/E-EPLT-120053961
Reference44 articles.
1. Raizer, Y.P.Production and decay of charged particles. InGas Discharge Physics; Allen, J.E., Ed.; Springer-Verlag: Berlin, 1991; 10–65.
2. Electron Interactions With BCl3
3. Simulations of BCl3/Cl2/Ar plasmas with comparisons to diagnostic data
4. REACTIVE ION ETCHING OF III–V SEMICONDUCTORS
5. High-density plasma etching of compound semiconductors
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