Submicrosecond X-ray lithography-Reference-Cited by-同舟云学术

Submicrosecond X-ray lithography

Published:1978 Issue:24 Volume:14 Page:781
ISSN:0013-5194
Container-title:Electronics Letters
language:en
Short-container-title:Electron. Lett.

Author:

Nagel D.J.,Peckerar M.C.,Whitlock R.R.,Greig J.R.,Pechacek R.E.

Publisher

Institution of Engineering and Technology (IET)

Subject

Electrical and Electronic Engineering

Link

https://digital-library.theiet.org/content/journals/10.1049/el_19780528?crawler=true&mimetype=application/pdf

Reference13 articles.

1. Spiller, E., and Feder, R.: Queisser, H.-J., X-ray optics, (Springer-Verlag, Berlin 1977), p. 35–92

2. Mallozzi, P.J., Epstein, H.M., Jung, R.G., Applebaum, D.C., Fairand, B.P., and Gallagher, W.J.: Feld, M.S., Javan, A., Kurnit, N.A., Fundamental and applied laser physics, (Wiley, New York 1973), p. 165–220

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