Author:
Sealy B.J.,Tan B.L.,Gwilliam R.M.,Reeson K.J.,Jeynes C.
Publisher
Institution of Engineering and Technology (IET)
Subject
Electrical and Electronic Engineering
Reference15 articles.
1. Wilson, I.H.: ‘Synthesis of dielectric layers by ion implantation’, Mazzoldi, P., Arnold, G., Ion beam modification of insulators, (Elsevier, Netherlands 1987),Chap. 7, p. 245–298in
2. White, A.E., Short, K.T., Berger, S.D., Huggins, H.A., and Loretto, D.: Lateral confinement of silicide layers with high dose implantation and annealing, (Mat. Res. Soc., San Diego, CA 1989 April)
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15 articles.
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