Controlled growth of extended arrays of CoSi2 hexagonal nanoplatelets buried in Si(001), Si(011) and Si(111) wafers-Reference-Cited by-同舟云学术

Controlled growth of extended arrays of CoSi2 hexagonal nanoplatelets buried in Si(001), Si(011) and Si(111) wafers

Published:2015 Issue:7 Volume:17 Page:4945-4951
ISSN:1463-9076
Container-title:Phys. Chem. Chem. Phys.
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Kellermann G.¹²³,Montoro L. A.⁴⁵⁶,Giovanetti L. J.⁷⁸,dos Santos Claro P. C.⁷⁸,Zhang L.⁹¹⁰¹¹¹²,Ramirez A. J.¹³¹⁴¹⁵,Requejo F. G.⁷⁸,Craievich A. F.¹⁶¹⁷¹⁸

Affiliation:

1. Departamento de Física

2. Universidade Federal do Paraná

3. Curitiba, Brazil

4. Departamento de Química

5. Universidade Federal de Minas Gerais

6. Belo Horizonte, Brazil

7. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas (INIFTA, CONICET, Departamento de Química, Facultad de Ciencias Exactas, Universidad Nacional de La Plata)

8. 1900 La Plata, Argentina

9. School of Chemical

10. Biological & Materials Engineering

11. University of Oklahoma

12. Norman, USA

13. Brazilian Nanotecnology National Laboratory (LNNano)

14. Caixa Postal 6192-CEP 13083-970

15. Campinas, Brazil

16. Institute of Physics

17. University of Sao Paulo

18. São Paulo, Brazil

Abstract

Hexagonal nanoplatelets buried in (a) Si(111) and (b) Si(001). (c) Characteristic V-shape patterns obtained for oriented hexagonal nanoplatelets buried in a Si(001) wafer.

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2015/CP/C4CP04738A

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