Insights on the Quality of 4h-Sic Layers Epitaxially Grown on Homogeneous Substrates by Changing the Rotational Speed of Susceptor in the Cvd Reactor

Author:

Tang Zhuo-Rui,Jin Lei,Gu Lin,Dai Ke-Feng,Mao Chao-Bin,Wu San-Zhong,Fan Jiajie,Ma Hong-Ping,Zhang Guoqi

Publisher

Elsevier BV

Reference58 articles.

1. Native point defects and carbon clusters in 4H-SiC: A hybrid functional study[J];T Kobayashi;Journal of Applied Physics,2019

2. The structural and electronic properties of Carbon-related point defects on 4H-SiC (0001) surface[J];S Wei;Applied Surface Science,2022

3. Influence of processing and of material defects on the electrical characteristics of SiC-SBDs and SiC-MOSFETs[C];K Fukuda;Materials science forum,2010

4. A Vapor-Liquid-Solid Mechanism for Growing 3C-SiC Single-Domain Layers on 6H-SiC (0001)[J];M Soueidan;Advanced Functional Materials,2006

5. Chloride-based CVD of 3C-SiC epitaxial layers on 6H (0001) SiC[J];S Leone;physica status solidi (RRL)-Rapid Research Letters,2010

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