Thermodynamic Study on SiCl4 Hydrogenation System in Siemens Process

Author:

Hou Yanqing1,Xie Gang12,Tao Dongping1,Yu Xiaohua1,Li Rongxing1,Song Dongming13

Affiliation:

1. Faculty of Metallurgical and Energy Engineering, Kunming University of Science and Technology

2. Technolygy Center of Yunnan Metallurgy Group Co.

3. Kunming Yeyan New-Material Co., Ltd.

Publisher

Society of Chemical Engineers, Japan

Subject

General Chemical Engineering,General Chemistry

Reference17 articles.

1. Chemical Processes in Vapor Deposition of Silicon: I . Deposition from and Etching by

2. Epitaxial Growth of Silicon by Hydrogen Reduction of SiHCl[sub 3] onto Silicon Substrates

3. Diana, M., L. D. Marino, L. Mastrant and R. Rossi; “Thermodynamic Analysis of the Reduction of Silicon Chlorides with Hydrogen in the 300–4500 K Temperature Range,” Rev. Int. Hautes Temper. Refact., 18, 203–209 (1981)

4. A Thorough Thermodynamic Evaluation of the Silicon-Hydrogen-Chlorine System

5. Kee, R. J., F. M. Rupley and J. A. Miller; “The Thermodynamic Data for Silanes and Chlorosilanes,” Sandia National Laboratories Report SAND, 87-8215B, 1–87 (1990)

Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3