Modeling Titanium Oxide Growth by Chemical Vapor Deposition Using Titanium Tetra Isopropoxide
Author:
Affiliation:
1. Graduate School of Engineering, Tokai University
Publisher
Society of Chemical Engineers, Japan
Subject
General Chemical Engineering,General Chemistry
Link
http://www.jstage.jst.go.jp/article/jcej/41/8/41_07WE118/_pdf
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3. Shape of Film Grown on Microsize Trenches and Holes by Chemical Vapor Deposition: 3-Dimensional Monte Carlo Simulation
4. Reaction analysis for ZrO2 and Y2O3 thin film growth by low-pressure metalorganic chemical vapor deposition using β-diketonate complexes
5. Electrochemical Photolysis of Water at a Semiconductor Electrode
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