Heat and Mass Transfer Analysis for Coating Process of TiN Thin Film in a Tubular Reactor by Thermal CVD-Reference-Cited by-同舟云学术

Heat and Mass Transfer Analysis for Coating Process of TiN Thin Film in a Tubular Reactor by Thermal CVD

Published:2014 Issue:5 Volume:40 Page:425-431
ISSN:0386-216X
Container-title:KAGAKU KOGAKU RONBUNSHU
language:en
Short-container-title:KAGAKU KOGAKU RONBUNSHU

Author:

Hatori Yuya¹²,Yamamoto Hiroki²,Tanoue Ken-ichiro²,Nishimura Tatsuo²

Affiliation:

1. UBE Industries, Ltd.

2. Department of Mechanical Engineering, Graduate School of Science and Engineering, Yamaguchi University

Publisher

Society of Chemical Engineers, Japan

Subject

General Chemical Engineering,General Chemistry

Link

https://www.jstage.jst.go.jp/article/kakoronbunshu/40/5/40_13wh113/_pdf

Reference22 articles.

1. Akiyama, Y., T. Sato and N. Imaishi; “Reaction Analysis for ZrO₂ and Y₂O₃ Thin Film Growth by Low-pressure Metalorganic Chemical Vapor Deposition Using β–Diketonate Complexes,” J. Cryst. Growth, 147, 130–146 (1995)

2. Akiyama, Y.; “Analysis of Film Growth Process via Chemical Vapor Deposition based on Reaction Engineering,” Proc. Schl. Eng. Tokai Univ., 45, 115–120 (2005)

3. Akiyama, Y., K. Shitanaka and H. Murakami; “Modeling Titanium Oxide Growth by Chemical Vapor Deposition Using Titanium Tetra Isopropoxide,” J. Chem. Eng. Jpn., 41, 779–784 (2008)

4. Bird, R. B., W. E. Stewart and E. N. Lightfoot; Transport Phenomena 2nd.ed., pp. 521–542, John Wiley & Sons, Inc. (1960)

5. Choy, L. K.; “Chemical Vapour Deposition of Coatings,” Prog. Mater. Sci., 48, 57–170 (2003)

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Dependence of Oxygen Concentration and Temperature on the Growth Rate Distribution of SiO₂ Solid Film by Chemical Vapor Deposition in the Hexamethyldisiloxane-oxygen System;Journal of the Japan Institute of Energy;2021-10-20

2. Heat and Mass Transfer Analysis during SiO₂ Film Coating by Thermal CVD;Journal of the Japan Institute of Energy;2019-10-20