Modeling and analysis of sulfur hexafluoride plasma etching for silicon microcavity resonators-Reference-Cited by-同舟云学术

Modeling and analysis of sulfur hexafluoride plasma etching for silicon microcavity resonators

Published:2021-10-19 Issue:12 Volume:31 Page:125003
ISSN:0960-1317
Container-title:Journal of Micromechanics and Microengineering
language:
Short-container-title:J. Micromech. Microeng.

Author:

Aguinsky Luiz Felipe^ORCID,Wachter Georg,Manstetten Paul^ORCID,Rodrigues Frâncio^ORCID,Trupke Michael,Schmid Ulrich,Hössinger Andreas,Weinbub Josef^ORCID

Funder

TU Wien Bibliothek

Austrian Federal Ministry for Digital and Economic Affairs, the National Foundation for Research, Technology and Development and the Christian Doppler Research Association

Horizon 2020 Framework Programme

Österreichische Forschungsförderungsgesellschaft

Austrian Science Fund

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1088/1361-6439/ac2bad/pdf

Reference63 articles.

1. Strong Coupling of Two Individually Controlled Atoms via a Nanophotonic Cavity

2. From cavity to circuit quantum electrodynamics

3. Cavity-enhanced dual-comb spectroscopy

4. Frequency comb spectroscopy

5. A sub-40-mHz-linewidth laser based on a silicon single-crystal optical cavity

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1. Curvature based feature detection for hierarchical grid refinement in TCAD topography simulations;Solid-State Electronics;2022-05

2. Phenomenological modeling of low-bias sulfur hexafluoride plasma etching of silicon;Solid-State Electronics;2022-05