Author:
Law V J,Jones G A C,Tewordt M
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Cited by
3 articles.
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1. Chloromethane-based reactive ion etching of GaAs and InP;Semiconductor Science and Technology;1992-02-01
2. Alkane based plasma etching of GaAs;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1991-05
3. CH4 :H2 :Ar rf/ECR Plasma Etching of GaAs and InP;MRS Proceedings;1991