High performance power VDMOSFETs with a split-gate floating np-well design

Author:

Liao Chien-Nan,Chien Feng-Tso,Chen Chii-Wen,Cheng Ching-Hwa,Tsai Yao-Tsung

Publisher

IOP Publishing

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Design of a 1.2 kV SiC MOSFET with Buried Oxide for Improving Switching Characteristics;Electronics;2024-03-01

2. 1.2 kV SiC MOSFETs with tapered buffer oxide for the suppression of the electric field crowding effect;Japanese Journal of Applied Physics;2023-11-01

3. 600-V shielded trench split-gate VDMOS improving the figure of merit;International Journal of Electronics;2019-11-20

4. Temperature Effects on Resistance of Power Devices;2016 International Symposium on Computer, Consumer and Control (IS3C);2016-07

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