Measurements of electron attachment lineshapes and cross sections at ultra-low electron energies for CF2Cl2, c-C4F6, c-C4F8and c-C7F14
Author:
Publisher
IOP Publishing
Subject
Atomic and Molecular Physics, and Optics
Link
http://stacks.iop.org/0022-3700/20/i=4/a=023/pdf
Reference24 articles.
1. Measurements of electron attachment lineshapes and cross sections at ultralow electron energies for c-C6F10, c-C6F12, C8F16and 1,1,2-C2Cl3F3
2. Rate coefficients for the attachment reactions of electrons with c-C7F14, CH3Br, CF3Br, CH2Br2and CH3I determined between 200 and 600K using the FALP technique
3. Electron attachment to perfluoromethylcyclohexane (c-C7F14) and perfluoro-1-heptene (1-C7F14)
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1. Dichlorodifluoromethane (CCl2F2);Gaseous Electronics;2011-12-02
2. Low-Energy Electron Attachment to the Dichlorodifluoromethane (CCl2F2) Molecule;The Journal of Physical Chemistry A;2009-12-29
3. Experimental and Theoretical Studies of Radical Production in RF CCP Discharge at 81-MHz Frequency in $\hbox{Ar/CF}_{4}$ and $\hbox{Ar/CHF}_{3}$ Mixtures;IEEE Transactions on Plasma Science;2009-09
4. Measurement of the electron attachment rates for SF6 and C7F14 at Te=0.2 eV in a magnetized Q machine plasma;The Journal of Chemical Physics;2008-12-14
5. Monte Carlo simulation of electron swarm parameters in c-C4F8;The European Physical Journal Applied Physics;2007-06
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