Rate coefficients for the attachment reactions of electrons with c-C7F14, CH3Br, CF3Br, CH2Br2and CH3I determined between 200 and 600K using the FALP technique
Author:
Publisher
IOP Publishing
Subject
Atomic and Molecular Physics, and Optics
Link
http://stacks.iop.org/0022-3700/17/i=18/a=019/pdf
Reference22 articles.
1. Measurements of the dissociative recombination coefficients of O2+, NO+and NH4+in the temperature range 200-600K
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3. Electron disappearance in pulse irradiated CH3Cl, C2H5Cl, CH3Br, and C2H5Br
4. Electron Attachment to Halogenated Aliphatic Hydrocarbons
5. Experimental Determination of Rate Constants for Thermal Electron Attachment to Gaseous SF6 and C7F14
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