Black silicon method XI: oxygen pulses in SF6plasma-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Black silicon method XI: oxygen pulses in SF6plasma

Published:2010-06-11 Issue:7 Volume:20 Page:075027
ISSN:0960-1317
Container-title:Journal of Micromechanics and Microengineering
language:
Short-container-title:J. Micromech. Microeng.

Author:

Jansen H V,de Boer M J,Ma K,Gironès M,Unnikrishnan S,Louwerse M C,Elwenspoek M C

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,Electronic, Optical and Magnetic Materials

Reference27 articles.

1. Black silicon method: X. A review on high speed and selective plasma etching of silicon with profile control: an in-depth comparison between Bosch and cryostat DRIE processes as a roadmap to next generation equipment

2. A survey on the reactive ion etching of silicon in microtechnology

3. The black silicon method. VIII. A study of the performance of etching silicon using SF6/O2-based chemistry with cryogenical wafer cooling and a high density ICP source

4. Guidelines for etching silicon MEMS structures using fluorine high-density plasmas at cryogenic temperatures

Cited by 31 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Bias-supply timing tailored to the aspect ratio dependence of silicon trench etching in Ar plasma with alternately injected C4F8 and SF6;Applied Surface Science;2023-11

2. Dry etching in the presence of physisorption of neutrals at lower temperatures;Journal of Vacuum Science & Technology A;2023-02-27

3. The Reflectance Characteristics of an Inverse Moth-Eye Structure in a Silicon Substrate Depending on SF6/O2 Plasma Etching Conditions;Micromachines;2022-09-20

4. Quasi In Situ XPS on a SiO_xF_y Layer Deposited on Silicon by a Cryogenic Process;ECS Journal of Solid State Science and Technology;2022-01-01

5. Fabrication of surface-enhanced Raman scattering substrate using black silicon layer manufactured through reactive ion etching;JOURNAL OF SENSOR SCIENCE AND TECHNOLOGY;2021-07-31

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3