Development rate of PMMA exposed to synchrotron x-ray radiation for LIGA applications

Author:

McNamara Shamus

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,Electronic, Optical and Magnetic Materials

Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Polymethyl Metacrylate with a Molecular Weight of 107 g/mol for X-ray Lithography;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2023-06

2. Polymethyl Methacrylate with a Molecular Weight of 10<sup>7</sup> g/mol for X-Ray Lithography;Поверхность. Рентгеновские, синхротронные и нейтронные исследования;2023-06-01

3. Process improvement of high aspect ratio nano-gratings based on synchrotron x-ray;Nanotechnology;2022-05-06

4. Fabrication of Micro-Patterned Surface for Pool-boiling Enhancement by Using Powder Injection Molding Process;Materials;2019-02-07

5. Microfabrication of sharp blazed gratings by a two-step height amplification process based on soft and deep X-ray lithography;Sensors and Actuators A: Physical;2014-01

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