Abstract
Abstract
The exploration of multi-gate-controlled electron transport characteristics is always a research focus in Si-based device development and optimization. In this work, we report individual and dual gate-controlled energy band regulations of 30 nm-thick Si membrane and the resulted electron transportations at 10–300 K. It is discovered that the fine energy band structure is a key element to determine electron transport behaviors in fully-depleted silicon-on-insulator. Furthermore, either the front or the back gate bias can modify the energy band bending and sub-band gap, change charged body distribution and intersub-band transition probability, and thus adjust electron mobility and device performance. This dual gate coupling effect together with the proposed gate-controlled sub-band structure model is confirmed by magnetotransport experiments at 1.6 K. Notably, our work presents the coupled gate controlling effects within ultrathin Si film, and gives a physical insight into electron structure modulating, which may promote the evolution of Si-based device applications in many domains.
Funder
National Natural Science Foundation of China
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials