The distribution of F-containing species in atmospheric nanosecond He/CF4 plasma with downstream dielectric material

Author:

Liu Jie,Wang LijunORCID,Zhang Runming,Lian Zhuoxi

Abstract

Abstract A two-dimensional self-consistent model has been established in order to investigate the distribution of F-containing species in He/CF4 atmospheric pressure plasma jet and the effect of CF4 concentration on the reactive F-containing species. A portion of electron energy is consumed whenever an F is ionized from the CF4, resulting that the average densities of CF 4 + , CF 2 + and CF+ decrease sequentially. The density of CF 3 + is greater than CF 4 + density due to Penning ionization of He* with CF4 and He+ + CF4 CF 3 + + F + He. In the case of He + 0.5% CF4 at 200 ns, the electron impact reactions mainly concentrate on the streamer head on the dielectric surface. The Penning ionization of He* with CF4 dominates in the region of 0 < r < 2.2 mm benefits from long-lived He* of high density and the high concentration CF4 in this region. As gas flow gradually mixes with ambient air (r > 2.2 mm), the Penning ionization of metastable He with N2 and O2 dominates in this area. As the CF4 concentration increases from 0.1% to 1%, the densities of F-containing positive ions all increase significantly. CF3, F and F2 also show the upward trend while there is little change in the spatial densities of CF2 and CF. The F-containing neutral species flux benefits from two factors: the diffusion and the conversion of positive ions. In the case of 0.1% CF4, due to the low density of CF 2 + , CF+ and F+ and the diffusion of F, the F flux for is consistent with CF2 and is greater than CF. However, when CF4 concentration exceeds 0.5%, the concentration of CF 3 + , CF 2 + and CF+ are much higher than F+. The quenching of positive ions dominates on the dielectric surface in the case of 0.5% and 1% CF4, resulting that the flux of F is lower than that of CF2 and CF.

Funder

State Key Laboratory of Electrical Insulation and Power Equipment Fund

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

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