Effect of CF4 additive on dynamic surface charge deposited on dielectric by helium atmospheric pressure plasma jet

Abstract

Abstract The addition of active trace components to non-thermal plasmas effectively enhances their chemical activity and has attracted considerable academic attention in the plasma community. It is essential to quantitatively estimate the effect of active addition on the properties of the plasma–surface interaction (PSI). In this study, we focus on the fundamental properties of dynamic surface charge deposited by a He-atmospheric pressure plasma jet (APPJ) with 0%–2% CF4 additive. The charge distribution is measured by a reflective optical measurement platform based on linear electro-optic effect, and is calculated with surface charge density inversion algorithm. Results show that a higher CF4 concentration can shrink the region of surface charge accumulation. Polarity effect is observed in aspects of maximum charge density when the CF4 concentration gradually rises. The negative charge deposition is suppressed by the addition of CF4, nearly disappearing at 2% concentration. While the maximum density of positive charge rises to ∼25 nC cm−2 at 0.5% CF4 before it decreases to ∼10 nC cm−2. The dispersions of total surface charge at 0.5% and 1.5% additives indicate the unstable periodic bombardment of ionization waves in He/CF4 APPJ. The double effect of CF4 additive on the surface charges by He-APPJ is also discussed. These results provide fresh and deep insights into the interaction between dielectric surface modification and ionization waves that occurs in other plasmas processing fed with composite gases.