Band bending analysis of charge characteristics at GeO2/Ge interface by x-ray photoemission spectroscopy-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Band bending analysis of charge characteristics at GeO2/Ge interface by x-ray photoemission spectroscopy

Published:2018-11-15 Issue:4 Volume:52 Page:045101
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Zhang Wenfeng^ORCID,Lou Xun,Xie Zijian,Chang Haixin

Funder

The National Natural Science Foundation of China

Key Laboratory of Advanced Technologies Materials, Ministry of Education

The Natural Science Foundation of Shenzhen

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://iopscience.iop.org/article/10.1088/1361-6463/aaed00/pdf

Reference45 articles.

1. Germanium CMOS potential from material and process perspectives: Be more positive about germanium

2. Academic and industry research progress in germanium nanodevices

3. (Invited) III-V/Ge MOS Transistor Technologies for Future ULSI

4. Effect of surface NH3 anneal on the physical and electrical properties of HfO2 films on Ge substrate

5. High-k gate stack on germanium substrate with fluorine incorporation

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Enhancing minority carrier lifetime in Ge: Insights from HF and HCl cleaning procedures;Journal of Vacuum Science & Technology A;2024-01-01

2. Progress on ultraviolet organic electroluminescence and lasing;Journal of Materials Chemistry C;2020

3. The visible and ultraviolet organic light-emitting diodes with germanium dioxide as facile solution-processed anode buffer layer;Current Applied Physics;2019-10

4. Ge pMOSFETs with GeOx Passivation Formed by Ozone and Plasma Post Oxidation;Nanoscale Research Letters;2019-04-05

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3