Nanoscale spatial limitations of large-area substrate conformal imprint lithography
Author:
Publisher
IOP Publishing
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering
Link
http://iopscience.iop.org/article/10.1088/1361-6528/ab1c86/pdf
Reference51 articles.
1. SOFT LITHOGRAPHY
2. Nanoimprint lithography: An old story in modern times? A review
3. Large area nanoimprint by substrate conformal imprint lithography (SCIL)
4. InGaN/GaN quantum-well heterostructure light-emitting diodes employing photonic crystal structures
5. III-nitride photonic-crystal light-emitting diodes with high extraction efficiency
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