Area-selective atomic layer deposition of Ru on electron-beam-written Pt(C) patterns versus SiO2substratum
Author:
Publisher
IOP Publishing
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering
Link
http://iopscience.iop.org/article/10.1088/1361-6528/aa8844/pdf
Reference72 articles.
1. Nanopatterning by Area-Selective Atomic Layer Deposition
2. The use of atomic layer deposition in advanced nanopatterning
3. Applications of atomic layer deposition to nanofabrication and emerging nanodevices
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