Atomic layer deposition and selective etching of ruthenium for area-selective deposition: Temperature dependence and supercycle design-Reference-Cited by-同舟云学术

Atomic layer deposition and selective etching of ruthenium for area-selective deposition: Temperature dependence and supercycle design

Published:2021-05 Issue:3 Volume:39 Page:032412
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Vos Martijn F. J.¹^ORCID,Chopra Sonali N.¹²^ORCID,Ekerdt John G.²^ORCID,Agarwal Sumit³^ORCID,Kessels Wilhelmus M. M. (Erwin)¹^ORCID,Mackus Adriaan J. M.¹^ORCID

Affiliation:

1. Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600, MB, Eindhoven, The Netherlands

2. McKetta Department of Chemical Engineering, The University of Texas at Austin, 200 East Dean Keeton Street, Stop C0400, Austin, Texas 78712

3. Department of Chemical and Biological Engineering, Colorado School of Mines, 1613 Illinois Street, Golden, Colorado 80401

Funder

Nederlandse Organisatie voor Wetenschappelijk Onderzoek

National Science Foundation

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://avs.scitation.org/doi/am-pdf/10.1116/6.0000912

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