Effect of rapid thermal annealing on the structural and electrical properties of RF sputtered CCTO thin film
Author:
Publisher
IOP Publishing
Subject
General Medicine
Link
http://stacks.iop.org/1757-899X/178/i=1/a=012009/pdf
Reference11 articles.
1. High Dielectric Constant in ACu3Ti4O12 and ACu3Ti3FeO12 Phases
2. Giant dielectric constant response in a copper-titanate
3. CaCu3Ti4O12: One-step internal barrier layer capacitor
4. Evidence for the existence of a metal-insulator-semiconductor junction at the electrode interfaces of CaCu3Ti4O12 thin film capacitors
5. CaCu3Ti4O12 thin films with non-linear resistivity deposited by RF-sputtering
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1. Wetting state and mechanical property alteration for the Fe3Si films using rapid thermal annealing under various temperatures;Heliyon;2023-12
2. Investigation of morphological and electrical properties of RTA-processed TiO2 for memristor application;Journal of Sol-Gel Science and Technology;2020-09-03
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