Hydrogen plasma treatment of very thin p-type nanocrystalline Si films grown by RF-PECVD in the presence of B(CH3)3-Reference-Cited by-同舟云学术

Hydrogen plasma treatment of very thin p-type nanocrystalline Si films grown by RF-PECVD in the presence of B(CH3)3

Published:2012-08 Issue:4 Volume:13 Page:045004
ISSN:1468-6996
Container-title:Science and Technology of Advanced Materials
language:en
Short-container-title:Science and Technology of Advanced Materials

Author:

Filonovich Sergej Alexandrovich,Águas Hugo,Busani Tito,Vicente António,Araújo Andreia,Gaspar Diana,Vilarigues Marcia,Leitão Joaquim,Fortunato Elvira,Martins Rodrigo

Publisher

Informa UK Limited

Subject

General Materials Science

Link

http://www.tandfonline.com/doi/pdf/10.1088/1468-6996/13/4/045004

Reference31 articles.

1. Material and solar cell research in microcrystalline silicon

2. Thin Film Poly-Si Solar Cell on Glass Substrate Fabricated at Low Temperature

3. Nanostructure in the p-layer and its impacts on amorphous silicon solar cells

4. Hydrogenated p-type nanocrystalline silicon in amorphous silicon solar cells

5. Interaction between growing amorphous silicon and glass substrate evidenced byinsituinfrared ellipsometry

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