Abstract
Abstract
In this paper, we designed a low turn-on voltage (V
On) AlGaN/GaN lateral field-effect rectifier (LFER) compatible with p-GaN gate high-electron-mobility transistor (HEMT) technology (PG-LFER). We also established an analytical model on the gated control two-dimensional-electron-gas density (n
S) distributions and V
On to investigate the underlying mechanism. The designed PG-LFER features a p-GaN charge storage layer (CSL) under the anode terminal. Net negative charge density in the p-GaN CSL (σ
p-GaN) is associated with the activated doping concentration of p-GaN CSL (N
p-GaN) and p-GaN CSL thickness (t
p-GaN). V
On of the PG-LFER is significantly lowered due to the low σ
p-GaN caused by reducing the N
p-GaN and t
p-GaN. Meanwhile, the low V
On PG-LFER also preserves recognizable reverse blocking and capacitance characteristics. Verified by the calibrated simulation, the designed PG-LFER shows 70% lower V
On compared with the non-optimized LFER with a high σ
p-GaN. Compatible with p-GaN gate HEMT technology, the designed PG-LFER with improved performance is a promising candidate for power integrated applications.
Funder
National Natural Science Foundation of China
State Key Laboratory of Wide-Bandgap Semiconductor Power Electronic Devices
Key-Area Research and Development Program of Guangdong Province
Guangdong Basic and Applied Basic Research Foundation
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Cited by
5 articles.
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