Plasma boundary of nonlinear sheath dynamics for arbitrary waveforms in capacitive discharge

Abstract

Abstract Capacitively coupled RF discharges (RF-CCPs) can offer a higher quality of semiconductor fabricating and processing thin film by applied full y arbitrary waveforms. Using different applied arbitrary voltage waveform, one can design varies distributions with specific tailoring features. Analyzing RF -CCPs dynamics using non-harmonically modulated sheath is more complicated. In this theoretical study of fluid model, various types of excitation waveforms, such as square, sawtooth, dual frequency, and pulse-like excitation were applied. Furthermore, different important semi-analytical descriptions, such as the particle density, instantaneous electric field distributions, the voltage and the effective charge-voltage of time characteristics of arbitrary waveforms are obtained. By applying the collision and collisionless self-consistent numerical solutions of the fluid model all complex dynamics are accomplished. In addition, by using the model of an ensemble in space-time (EST) it is found that arbitrary waveforms can offer more possibilities for tailoring IEDs for a purpose in collisionless regimes more than collisional regimes. Moreover, mo re control of RF-CCPs will be achieved for the different purpose of materials processing.