Research of the influence of bias voltage on the structure and residual stress in Ta/W coatings applied on a copper substrate by inverted magnetron

Abstract

Abstract This paper presents the results of studying the effect of the bias voltage on a copper tube substrate on the texture and residual stresses in 4-layer Ta/W/Ta/W coatings deposited with an inverted magnetron. It is shown that, in contrast to monolayer coatings of Ta and W, in which residual stresses exceeding 2 GPa are formed on the substrate at high voltages on the substrate, stress relaxations occur in the 4-layer coating in alternating layers differing in LTEC values and in the outer W-layer of stress practically absent.