Alpha- vs. beta-W nanocrystalline thin films: A comprehensive study of sputter parameters and resulting materials' properties-Reference-Cited by-同舟云学术

Alpha- vs. beta-W nanocrystalline thin films: A comprehensive study of sputter parameters and resulting materials' properties

Published:2015-02 Issue: Volume:577 Page:26-34
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Vüllers F.T.N.,Spolenak R.

Funder

Competence Centre for Materials Science and Technology, Switzerland

Plansee Powertech AG

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference37 articles.

1. Springer Handbook of Condensed Matter and Materials Data;Martienssen,2005

2. J.G. Fleming, S.S. Mani, J.J. Sniegowski, R.S. Blewer, Tungsten coating for improved wear resistance and reliability of microelectromechanical devices, United States Patent No. 62908592001.

3. Phase transformation of thin sputter-deposited tungsten films at room temperature;Rossnagel;J. Vac. Sci. Technol. B: Nanotechnol. Microelectron.: Mater. Process. Meas. Phenom.,2002

4. T.Z. Hossain, A.R. Ghatak-roy, A. Evans, Tungsten interconnect method, United States Patent No. 62744722001.

5. The origin of stress in sputter-deposited tungsten films for X-ray masks;Itoh;J. Vac. Sci. Technol. B: Nanotechnol. Microelectron.: Mater. Process. Meas. Phenom.,1991

Cited by 83 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Diffraction and microstructure study of miscible interfaces in metallic multilayers;Materials Characterization;2024-11

2. Preparation of high-density and excellent bending strength pure tungsten target by hot oscillatory pressing sintering and its magnetron sputtering coating;International Journal of Refractory Metals and Hard Materials;2024-09

3. Characterization of MoS2:Nb sputtered thin films. An application as Hole Transport Layer in Cu2ZnSnS4/Si tandem solar cells;Thin Solid Films;2024-09

4. Effect of sputtering power and thickness ratios on the materials properties of Cu–W and Cu–Cr bilayer thin films using high power impulse magnetron and DC magnetron sputtering;Journal of Vacuum Science & Technology A;2024-08-28

5. Deposition pressure-controlled phase tailoring and stability of β-W for spintronic applications;Journal of Applied Physics;2024-07-23