Author:
Kapp M.,Martinschitz K. J.,Keckes J.,Lackner J. M.,Zizak I.,Dehm G.
Publisher
Springer Science and Business Media LLC
Reference21 articles.
1. Durand, N., K. F. Badawi and Ph. Goudeau: Influence of microstructure on residual stress in tungsten thin films analyzed by X-ray diffraction. Thin Solid Films 275 (1996) 168–171
2. Ely, T., P. K. Predecki and I. C. Noyan: Residual stress gradients in a tungsten film by grazing-incidence XRD. JCPDS-International Centre for Diffraction Data (1999)
3. Noyan, I. C., and C. C. Goldsmith: Origin of Oscillations in d vs sin2ψ plots measured from tungsten thin films. JCPDS International Centre for Diffraction Data (1997)
4. Petroff, P., T. T. Sheng and A. K. Sinha, G. A. Rozgonyi, and F. B. Alexander: Microstructure, growth, resistivity, and stresses in thin tungsten films deposited by r.f. sputtering. J. Appl. Phys. 44, No. 6 (1973), 2545–2554
5. Djerdj, I., A. M. Tonejc, A. Tonejc and N. Radic: XRD line profile analysis of tungsten thin films. Vacuum 80 (2005), 151–158
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