Microwave electron cyclotron resonance plasma metal organic chemical vapour deposition of Y2O3 coatings
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Reference11 articles.
1. Optical, electrical, and structural characteristics of yttrium oxide films deposited on plasma etched silicon substrates
2. Catalyst-Enhanced Chemical Vapor Deposition of Yttrium Oxide
3. New sterically hindered Hf, Zr and Y β-diketonates as MOCVD precursors for oxide films
4. Properties of Metalorganic Precursors for Chemical Vapor Deposition of Oxide Superconductors
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1. Bias-independent growth of carbon nanowalls by microwave electron-cyclotron resonance plasma CVD;Journal of Experimental Nanoscience;2012-07-03
2. Microwave ECR Plasma Assisted MOCVD of Y2O3 Thin Films Using Y(tod)3 Precursor and Their Characterization;Plasma Processes and Polymers;2011-06-28
3. Effects of precursor evaporation temperature on the properties of the yttrium oxide thin films deposited by microwave electron cyclotron resonance plasma assisted metal organic chemical vapor deposition;Thin Solid Films;2011-03
4. Effect of argon ion activity on the properties of Y2O3 thin films deposited by low pressure PACVD;Applied Surface Science;2010-10
5. Microwave ECR plasma CVD of cubic Y2O3 coatings and their characterization;Surface and Coatings Technology;2010-07
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