Microwave ECR Plasma Assisted MOCVD of Y2O3 Thin Films Using Y(tod)3 Precursor and Their Characterization-Reference-Cited by-同舟云学术

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Microwave ECR Plasma Assisted MOCVD of Y2O3 Thin Films Using Y(tod)3 Precursor and Their Characterization

Published:2011-06-28 Issue:8 Volume:8 Page:740-749
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Processes Polym.

Author:

Barve Shruti,Deo Mukul,Kar Rajib,Sreenivasan Nimisha,Kishore Ramaswamy,Biswas Arup,Bhanage Bhalchandra,Rao Mohan,Gantayet Lalit Mohan,Patil Dinkar

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Reference25 articles.

1. Microwave electron cyclotron resonance plasma metal organic chemical vapour deposition of Y2O3 coatings

2. Electron cyclotron resonance microwave discharges for etching and thin‐film deposition

3. Growth of yttrium oxide thin films from β-diketonate precursor

4. Characterization and structures of the 2,2,7-trimethyl-3,5-octanedionate chelates of cerium(IV) and terbium(III)

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomic layer deposition of Y2O3 as high-k dielectrics by using a heteroleptic yttrium precursor and water;Journal of Alloys and Compounds;2024-07

2. High transparency Pr:Y2O3 ceramics: A promising gain medium for red emission solid-state lasers;Journal of Advanced Ceramics;2022-05-11

3. Thermal Atomic Layer Deposition of Yttrium Oxide Films and Their Properties in Anticorrosion and Water Repellent Coating Applications;Coatings;2021-04-23

4. Effect of processing gas compositions on growth of carbon nanowalls by ECR-CVD process;Materials Research Express;2019-03-20

5. Effects of post-deposition annealing on the chemical composition, microstructure, optical and mechanical properties of Y2O3 film;Surface and Coatings Technology;2018-06

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