Fabrication of a three-dimensional nanoimprint mold by using electron beam lithography with consideration of the proximity effect
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Reference5 articles.
1. Sub-100-nm-Scale Patterning Using a Low-Energy Electron Beam
2. Low voltage alternative for electron beam lithography
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1. Fabrication of Complex 3D Nanoimprint Mold by Using Acceleration Voltage Electron Beam Lithography;Journal of Photopolymer Science and Technology;2018-06-25
2. Fabrication characteristics of a line-and-space pattern and a dot pattern on a roll mold by using electron-beam lithography;Journal of Advanced Mechanical Design, Systems, and Manufacturing;2016
3. Super-resolution technique for nanoimprint mold using elastic UV-curable resin;Microelectronic Engineering;2013-10
4. Optimization of 3D patterning by Ga implantation and reactive ion etching (RIE) for nanoimprint lithography (NIL) stamp fabrication;Microelectronic Engineering;2012-09
5. The fabrication of 3-D nanostructures by a low- voltage EBL;Applied Surface Science;2011-02
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