Fabrication characteristics of a line-and-space pattern and a dot pattern on a roll mold by using electron-beam lithography
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Published:2016
Issue:5
Volume:10
Page:JAMDSM0074-JAMDSM0074
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ISSN:1881-3054
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Container-title:Journal of Advanced Mechanical Design, Systems, and Manufacturing
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language:en
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Short-container-title:JAMDSM
Author:
OJIMA Kai1, SAITO Masashi1, UNNO Noriyuki1, TANIGUCHI Jun1
Affiliation:
1. Department of Applied Electronics, Tokyo University of Science
Publisher
Japan Society of Mechanical Engineers
Subject
Industrial and Manufacturing Engineering,Mechanical Engineering
Reference13 articles.
1. Abe, M., Kitada, T., Ito, N., Tanaka, T., Ataka, M., Kishiro, T., and Matsui, S., Fabrication of Large Area Seamless Roller Mold using Fast EB Lithography (rEBL) for R2R Process, Proceedings of the 37th International Conference on Micro and Nano Engineering, (2011), p.28. 2. Ahn, S. H. and Guo, L. J., High-speed roll-to-roll nanoimprint lithography on flexible plastic substrates, Advanced Materials, Vol.20, No.11 (2008), pp.2044-2049. 3. Ahn, S., Cha, J., Myung, H., Kim, S.-m., and Kang, S., Continuous ultraviolet roll nanoimprinting process for replicating large-scale nano- and micropatterns, Applied Physics Letters, Vol.89, No. 21 (2006), 213101. 4. Haisma, J., Verheijen, M., van den Heuvel, K., and van den Berg, J., Mold-assisted nanolithography: A process for reliable pattern replication, Journal of Vacuum Science and Technology B, Vol.14, No.6 (1996), pp.4124-4128. 5. Masuda, H., Yamada, H., Satoh, M., Asoh, H., Nakao, M., and Tamamura, T., Highly ordered nanochannel-array architecture in anodic alumina, Applied Physics Letters, Vol.71, No. 19 (1997), 2770.
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