Kinetic model of a low-pressure microwave discharge in O2-H2including the effects of O-ions on the characteristics for plasma maintenance
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference55 articles.
1. Pulsed microwave plasma etching of polymers in oxygen and nitrogen for microelectronic applications
2. Etch rate enhancement of photoresist in nitrogen‐containing plasmas
3. Mechanisms of silicon oxidation at low temperatures by microwave‐excited O2gas and O2‐N2mixed gas
4. Nitrogen dioxide emitted from space shuttle surfaces and shuttle glow
5. Validity of actinometry to monitor oxygen atom concentration in microwave discharges created by surface wave in O2‐N2mixtures
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