Pulsed microwave plasma etching of polymers in oxygen and nitrogen for microelectronic applications-Reference-Cited by-同舟云学术

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Pulsed microwave plasma etching of polymers in oxygen and nitrogen for microelectronic applications

Published:1988-12 Issue:6 Volume:16 Page:631-637
ISSN:0093-3813
Container-title:IEEE Transactions on Plasma Science
language:
Short-container-title:IEEE Trans. Plasma Sci.

Author:

Lin T.H.,Belser M.,Tzeng Y.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Condensed Matter Physics,Nuclear and High Energy Physics

Link

http://xplorestaging.ieee.org/ielx1/27/597/00016551.pdf?arnumber=16551

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